Researchers developed a dual-modulated vertically stacked transistor that eliminates current leakage at nanoscale channel lengths, advancing low-power 3D chip integration.
A research team led by Professor Jae Eun Jang and Dr. Goeun Pyo from the Department of Electrical Engineering and Computer Science at DGIST has developed "dual-modulated vertically stacked transistors ...
Researchers developed a dual-modulated vertical transistor that suppresses leakage at nanoscale channels and supports ...
Recently, frequent Design Idea (DI) author Christopher Paul showcased an innovative and high performance true-two-wire current source using a depletion mode MOSFET as the pass device in “A precision, ...
Download the PDF of this issue that presents a ramp transistor leveraging MCU emulation of a unijunction transistor and how to achieve full-spectrum light with an LED microscope illuminator's current ...
A team of Chinese researchers has built a ferroelectric transistor with a gate length of just 1 nanometer that runs on 0.6 ...